eonni PURE CICA beauty mask

♡ contains soothing and repairing centella asiatica extract to promote the healing of damaged tissues and strengthen the skin barrier.

♡ combined with various repair ingredients such as probiotics and prebiotics, it effectively promotes collagen synthesis, activates the skin’s self-renewal potential, fades acne marks and scars, and restores firm, tender and smooth skin.

application

1. after thorough facial cleansing, gently place the mask over entire face
2. after 15 minutes, remove mask and wipe off excess essence
3. follow with the appropriate eonni moisturizer

ingredients: Hydrocotyle Asiatica Extract, Lactococcus Ferment Lysate, Prebiotics, Trehalose, Sodium Hyaluronate, Irriguard(Astragalus Membranaceus Root Extract, Saposhnikovia Divaricata Root Extract, Calendula Officinalis Flower Extract, Albizia Julibrissin Flower Extract, Gastrodia Elata Root Extract), Jasmine Essential Oil